Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit
Agedi Boto low, Pieter Kok, Daniel S. Abrams low, Samuel L. Braunstein, Colin P. Williams low, Jonathan P. Dowling
The source holds an abstract for this work, but its best open-access copy is under no open licence, which does not permit us to republish the text. Read it at the source below.
this paper
works it cites
works citing it
node size = global citations · hover for the full title
What cites it, inside the corpus
| Paper | Year | Cited |
|---|---|---|
| Quantum entanglement | 2009 | 10,195 |
| Advances in quantum metrology | 2011 | 3,963 |
| Quantum-Enhanced Measurements: Beating the Standard Quantum Limit | 2004 | 3,095 |
| Photonic quantum technologies | 2009 | 2,384 |
| Multiphoton entanglement and interferometry | 2012 | 1,442 |
Links
Topics
| Quantum Information and Cryptography | Computer Science |
| Quantum Mechanics and Applications | Physics and Astronomy |
| Mechanical and Optical Resonators | Physics and Astronomy |
Is this record sound?
complete
Nothing in this record contradicts itself and no field we check is missing.
- supports6 author record(s) attached.
- supports24 reference(s) recorded.
- neutralThe DOI carries no year to check against.
- supportsA title is present.
Provenance
sha256 b3024609427ad450…